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Special Gas -> NF3
NF3

NF3

NF3 is a colorless, stable, and toxic gas, which has been a chamber--cleaning gas in chemical-vapour deposition semiconductor production process and in LCD production. Application also includes etching of polysilicon, Silicon Nitride, Tungsten Silicate and Tungsten films. NF3 can also be used as laser gas.


QUALITY STANDARD FOR NF3

ITEM Company standard
NF3, 10-2(v/v) ≥ 99.5 99.9 99.98 99.99 99.996
CF4, 10-6(v/v) ≤ 1500 500 100 50 20
N2, 10-6(v/v) ≤ 700 50 10 10 5
O2+Ar, 10-6(v/v) ≤ 700 50 10 5 3
CO, 10-6(v/v) ≤ 50 10 10 5 1
CO2, 10-6(v/v) ≤ 25 10 10 5 0.5
N2O, 10-6(v/v) ≤ 50 10 10 5 1
SF6, 10-6(v/v) ≤ 50 50 10 5 2
Hydralysable fluorides(expressed as HF), 10-6(v/v) ≤ 1 1 1 1 1
H2O, 10-6(v/v) ≤ 1 1 1 1 1
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